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"In water treatment, we are concerned with silica because of its tendency to form deposits (scale) on surfaces it comes in contact with. In boiler and turbine systems, the deposition is often associated with temperature, pressure, and phase state changes that occur. In microelectronics, the concern is deposition and/or changes to the surface properties of the "silicon" wafers. In this paper, we take up the task of describing the behavior of aqueous silica and of the various water treatment processes used for its removal..."
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